Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronicsT. Novikova, A. De Martino, R. Ossikovski and B. DrévillonEur. Phys. J. Appl. Phys., 31 1 (2005) 63-69DOI: https://doi.org/10.1051/epjap:2005034