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Exchange bias studies of NiFe/FeMn/NiFe trilayer by ion beam etching

V. K. Sankaranarayanan, D. Y. Kim, S. M. Yoon, C. O. Kim and C. G. Kim

Eur. Phys. J. B, 45 2 (2005) 203-206

DOI: https://doi.org/10.1140/epjb/e2005-00055-1

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