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Structural characteristics of ultra-low k SiO₂ thin films prepared using a molecular template

Z.-W. He, W.-X. Sun, X.-Q. Liu, D.-Y. Xu, J. Gou and Y.-Y. Wang

Eur. Phys. J. B, 48 4 (2005) 463-468

DOI: https://doi.org/10.1140/epjb/e2006-00002-8

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