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Systematic investigation of the reactive ion beam sputter deposition process of SiO₂

Maria Mateev, Thomas Lautenschläger, Daniel Spemann, Annemarie Finzel, Jürgen W. Gerlach, Frank Frost and Carsten Bundesmann

Eur. Phys. J. B, 91 2 (2018) 45

DOI: https://doi.org/10.1140/epjb/e2018-80453-x

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EPJ A Topical Collection devoted to the legacy of Peter Schuck
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