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Carbon-free SiO_x films deposited from octamethylcyclotetrasiloxane (OMCTS) by an atmospheric pressure plasma jet (APPJ)

J. Schäfer, R. Foest, A. Quade, A. Ohl, J. Meichsner and K. D. Weltmann

Eur. Phys. J. D, 54 2 (2009) 211-217

DOI: https://doi.org/10.1140/epjd/e2009-00048-2

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