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A thorough FT-IR spectroscopy study on micrometric silicon oxide films deposited by atmospheric pressure microwave plasma torch

X. Landreau, B. Lanfant, T. Merle, C. Dublanche-Tixier and P. Tristant

Eur. Phys. J. D, 66 6 (2012) 160

DOI: https://doi.org/10.1140/epjd/e2012-20647-x

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