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On a non-thermal atmospheric pressure plasma jet used for the deposition of silicon-organic films

Jan Schäfer, Florian Sigeneger, Rüdiger Foest, Detlef Loffhagen and Klaus-Dieter Weltmann

Eur. Phys. J. D, 72 5 (2018) 90

DOI: https://doi.org/10.1140/epjd/e2017-80364-6

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