On a non-thermal atmospheric pressure plasma jet used for the deposition of silicon-organic filmsJan Schäfer, Florian Sigeneger, Rüdiger Foest, Detlef Loffhagen and Klaus-Dieter WeltmannEur. Phys. J. D, 72 5 (2018) 90DOI: https://doi.org/10.1140/epjd/e2017-80364-6