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Mathematical modeling of pattern formation caused by drying of colloidal film under a mask

Yuri Yu. Tarasevich, Irina V. Vodolazskaya and Lyudmila V. Sakharova

Eur. Phys. J. E, 39 2 (2016) 26

DOI: https://doi.org/10.1140/epje/i2016-16026-5

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